Invention Grant
- Patent Title: Pattern position detecting method
- Patent Title (中): 图案位置检测方法
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Application No.: US13524347Application Date: 2012-06-15
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Publication No.: US08805013B2Publication Date: 2014-08-12
- Inventor: Shigeru Amemiya
- Applicant: Shigeru Amemiya
- Applicant Address: JP Tokyo
- Assignee: Shinkawa Ltd.
- Current Assignee: Shinkawa Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Katten Muchin Rosenman LLP
- Priority: JP2011-133987 20110616
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A pattern position detecting method capable of reducing time for detecting a component position includes: acquiring a model image of a target; dividing the acquired model image into reference images each including a specific pattern; acquiring a detected image of the target; matching origins of the reference images respectively with predetermined positions on the detected image; comparing a region within the detected image with corresponding one of the reference images while moving the origin of the reference image in X and Y directions from the corresponding predetermined position and sequentially acquiring correlation values; integrating the correlation values at respective comparison positions within an integrated XY plane to generate integrated correlation values; and recognizing a value of integrated XY coordinates at a peak of the integrated correlation values as deviation of the specific patterns in the reference images from the predetermined positions of the target within the XY plane.
Public/Granted literature
- US20120321135A1 PATTERN POSITION DETECTING METHOD Public/Granted day:2012-12-20
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