Invention Grant
US08807978B2 Template manufacturing method, template inspecting method and inspecting apparatus, nanoimprint apparatus, nanoimprint system, and device manufacturing method
有权
模板制造方法，模板检查方法和检查装置，纳米压印装置，纳米压印系统和装置制造方法
- Patent Title: Template manufacturing method, template inspecting method and inspecting apparatus, nanoimprint apparatus, nanoimprint system, and device manufacturing method
- Patent Title (中): 模板制造方法，模板检查方法和检查装置，纳米压印装置，纳米压印系统和装置制造方法
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Application No.: US12967572Application Date: 2010-12-14
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Publication No.: US08807978B2Publication Date: 2014-08-19
- Inventor: Soichi Owa , Katsura Otaki
- Applicant: Soichi Owa , Katsura Otaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2008-159045 20080618; JP2008-159048 20080618
- Main IPC: C23F1/02
- IPC: C23F1/02 ; C23F1/00 ; B05D3/12
Abstract:
There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.
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