Invention Grant
- Patent Title: Photoresist composition and method of manufacturing array substrate using the same
- Patent Title (中): 光刻胶组合物及其制造方法
-
Application No.: US13050522Application Date: 2011-03-17
-
Publication No.: US08808963B2Publication Date: 2014-08-19
- Inventor: Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
- Applicant: Hi-Kuk Lee , Sang-Hyun Yun , Min-Soo Lee , Deok-Man Kang , Sae-Tae Oh , Jae-Young Choi
- Applicant Address: KR Yongin KR Seoul
- Assignee: Samsung Display Co., Ltd.,AZ Electronic Materials (KOREA) Ltd.
- Current Assignee: Samsung Display Co., Ltd.,AZ Electronic Materials (KOREA) Ltd.
- Current Assignee Address: KR Yongin KR Seoul
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2008-0017354 20080226
- Main IPC: G03C1/76
- IPC: G03C1/76
Abstract:
A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
Public/Granted literature
- US20110171581A1 PHOTORESIST COMPOSTION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME Public/Granted day:2011-07-14
Information query
