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US08809106B2 Method for semiconductor sensor structures with reduced dislocation defect densities 有权
具有减少位错缺陷密度的半导体传感器结构的方法

Method for semiconductor sensor structures with reduced dislocation defect densities
Abstract:
Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique.
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