Invention Grant
US08809114B2 Memory cell that employs a selectively grown reversible resistance-switching element and methods of forming the same 有权
使用选择性生长的可逆电阻切换元件的存储单元及其形成方法

Memory cell that employs a selectively grown reversible resistance-switching element and methods of forming the same
Abstract:
A method of forming a memory cell is provided that includes forming a steering element above a substrate, forming a material layer on the substrate, patterning and etching the material layer, and oxidizing the patterned and etched material layer to form a reversible resistance-switching material. Numerous other aspects are provided.
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