Invention Grant
- Patent Title: Method of large-area circuit layout recognition
- Patent Title (中): 大面积电路布局识别方法
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Application No.: US14021527Application Date: 2013-09-09
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Publication No.: US08809164B2Publication Date: 2014-08-19
- Inventor: Stephen W. Bedell , Bahman Hekmatshoartabari , Ali Khakifirooz , John A. Ott , Ghavam G. Shahidi , Davood Shahrjerdi
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Louis J. Percello, Esq.
- Main IPC: H01L21/304
- IPC: H01L21/304

Abstract:
Methods for detecting the physical layout of an integrated circuit are provided. The methods of the present disclosure allow large area imaging of the circuit layout without requiring tedious sample preparation techniques. The imaging can be performed utilizing low-energy beam techniques such as scanning electron microscopy; however, more sophisticated imaging techniques can also be employed. In the methods of the present disclosure, spalling is used to remove a portion of a semiconductor layer including at least one semiconductor device formed thereon or therein from a base substrate. In some cases, a buried insulator layer that is located beneath a semiconductor layer including the at least one semiconductor device can be completely or partially removed. In some cases, the semiconductor layer including the at least one semiconductor device can be thinned. The methods improve the detection quality that the buried insulator layer and a thick semiconductor layer can reduce.
Public/Granted literature
- US20140011307A1 METHOD OF LARGE-AREA CIRCUIT LAYOUT RECOGNITION Public/Granted day:2014-01-09
Information query
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