Invention Grant
- Patent Title: Method for deposition of at least one electrically conducting film on a substrate
- Patent Title (中): 在基板上沉积至少一个导电膜的方法
-
Application No.: US13143940Application Date: 2010-01-11
-
Publication No.: US08809192B2Publication Date: 2014-08-19
- Inventor: Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
- Applicant: Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips N.V.
- Current Assignee: Koninklijke Philips N.V.
- Current Assignee Address: NL Eindhoven
- Agent Yuliya Mathis
- Priority: EP09150520 20090114
- International Application: PCT/IB2010/050083 WO 20100111
- International Announcement: WO2010/082151 WO 20100722
- Main IPC: H01L21/443
- IPC: H01L21/443
Abstract:
A method for deposition of at least one electrically conducting film on a substrate, wherein the method includes the steps of: selecting a layer of a film material, wherein the layer includes a mask on a front side, and wherein the layer and the mask are one piece; positioning the front side of the layer upon the substrate; applying at least one laser pulse onto a back side of the layer, so as to melt and to vaporize at least parts of the layer such that melt droplets are propelled toward and deposited upon the substrate; and forming the film, wherein at least one slot of the mask limits the distribution of the melt droplets.
Public/Granted literature
- US20110318924A1 METHOD FOR DEPOSITION OF AT LEAST ONE ELECTRICALLY CONDUCTING FILM ON A SUBSTRATE Public/Granted day:2011-12-29
Information query
IPC分类:
