Invention Grant
- Patent Title: Method for surface treatment of copper and copper
- Patent Title (中): 铜和铜的表面处理方法
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Application No.: US13060095Application Date: 2009-06-17
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Publication No.: US08809696B2Publication Date: 2014-08-19
- Inventor: Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
- Applicant: Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JPP2008-275493 20081027
- International Application: PCT/JP2009/061050 WO 20090617
- International Announcement: WO2010/050266 WO 20100506
- Main IPC: H05K1/00
- IPC: H05K1/00

Abstract:
An object of the present invention is to provide a copper surface treatment method capable of keeping certainly a bonding strength between a copper surface and a resist, or between a copper surface and an insulating resin without forming irregularities having sizes of more than 1 μm on the copper surface, and a copper treated with the method. The surface treatment method, comprising: a first step of forming, on a copper surface, a nobler metal than the copper discretely; a second step, subsequent to the first step, of forming copper oxide on the copper surface by oxidation with an alkaline solution containing an oxidizing agent; and third step of dissolving the copper oxide so as to be removed, thereby forming irregularities on the copper surface.
Public/Granted literature
- US20110147072A1 METHOD FOR SURFACE TREATMENT OF COPPER AND COPPER Public/Granted day:2011-06-23
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