Invention Grant
- Patent Title: Semiconductor film, semiconductor element, semiconductor device, and method for manufacturing the same
- Patent Title (中): 半导体膜,半导体元件,半导体器件及其制造方法
-
Application No.: US13303543Application Date: 2011-11-23
-
Publication No.: US08809852B2Publication Date: 2014-08-19
- Inventor: Shunpei Yamazaki , Masahiro Takahashi , Tetsunori Maruyama
- Applicant: Shunpei Yamazaki , Masahiro Takahashi , Tetsunori Maruyama
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2010-267924 20101130
- Main IPC: H01L29/10
- IPC: H01L29/10

Abstract:
One of objects is to provide a semiconductor film having stable characteristics. Further, one of objects is to provide a semiconductor element having stable characteristics. Further, one of objects is to provide a semiconductor device having stable characteristics. Specifically, a structure which includes a seed crystal layer (seed layer) including crystals each having a first crystal structure, one of surfaces of which is in contact with an insulating surface, and an oxide semiconductor film including crystals growing anisotropically, which is on the other surface of the seed crystal layer (seed layer) may be provided. With such a heterostructure, electric characteristics of the semiconductor film can be stabilized.
Public/Granted literature
- US20120132907A1 SEMICONDUCTOR FILM, SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2012-05-31
Information query
IPC分类: