Invention Grant
- Patent Title: Microelectronic memory devices having flat stopper layers
- Patent Title (中): 具有平坦塞子层的微电子存储器件
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Application No.: US14016912Application Date: 2013-09-03
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Publication No.: US08809929B2Publication Date: 2014-08-19
- Inventor: Wonmo Park , Hyunchul Kim , Hyodong Ban , Hyunju Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2010-0078486 20100813
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L49/02 ; H01L21/205

Abstract:
Memory devices comprise a lower layer that extends across a cell array region and across a peripheral region and that includes a flat outer surface from the cell array region to the peripheral region. A signal transfer conductor layer extends in the cell array region beneath the flat outer surface of the lower layer and extends in the peripheral region above the flat outer surface of the lower layer. An insulating layer is provided on the lower layer, including a flat outer surface from the cell array region to the peripheral region. A flat stopper layer is provided on the flat outer surface of the insulating layer and extending across the cell array region and the peripheral region. Related methods are also provided.
Public/Granted literature
- US20140015028A1 MICROELECTRONIC MEMORY DEVICES HAVING FLAT STOPPER LAYERS Public/Granted day:2014-01-16
Information query
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