Invention Grant
- Patent Title: Focus offset contamination inspection
- Patent Title (中): 对焦偏移污染检查
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Application No.: US13251975Application Date: 2011-10-03
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Publication No.: US08810646B2Publication Date: 2014-08-19
- Inventor: Carl Hess
- Applicant: Carl Hess
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H04N7/18
- IPC: H04N7/18 ; G01N21/94 ; G01N21/956 ; G03F1/84

Abstract:
A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.
Public/Granted literature
- US20120086799A1 FOCUS OFFSET CONTAMINATION INSPECTION Public/Granted day:2012-04-12
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