Invention Grant
- Patent Title: Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
- Patent Title (中): 曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
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Application No.: US12453269Application Date: 2009-05-05
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Publication No.: US08810767B2Publication Date: 2014-08-19
- Inventor: Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
- Applicant: Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-182343 20040621; JP2004-237343 20040817; JP2004-327787 20041111
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20
Abstract:
A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
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