Invention Grant
- Patent Title: Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus
- Patent Title (中): 光刻设备，照明系统，投影系统以及使用光刻设备制造设备的方法
-
Application No.: US13050476Application Date: 2011-03-17
-
Publication No.: US08810769B2Publication Date: 2014-08-19
- Inventor: Jeroen Gerard Gosen , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
- Applicant: Jeroen Gerard Gosen , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
Public/Granted literature
Information query
