Invention Grant
US08810910B2 Antireflection optical device and method of manufacturing master 有权
防反射光学器件及其制造方法

  • Patent Title: Antireflection optical device and method of manufacturing master
  • Patent Title (中): 防反射光学器件及其制造方法
  • Application No.: US12597812
    Application Date: 2009-02-27
  • Publication No.: US08810910B2
    Publication Date: 2014-08-19
  • Inventor: Sohmei EndohKazuya Hayashibe
  • Applicant: Sohmei EndohKazuya Hayashibe
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: K & L Gates LLP
  • Priority: JP2008-046941 20080227
  • International Application: PCT/JP2009/054227 WO 20090227
  • International Announcement: WO2009/107871 WO 20090903
  • Main IPC: G02B1/10
  • IPC: G02B1/10 G02B1/11
Antireflection optical device and method of manufacturing master
Abstract:
An optical device is provided including plural structures formed of a convex portion or a concave portion are arranged on the surface of a base member with a fine pitch equal to or less than the wavelength of visible light. The structures are arranged on the surface of the base member to form plural lines of tracks and form a hexagonal lattice pattern or a quasi-hexagonal lattice pattern. Each structure has an elliptical cone shape or a truncated elliptical cone shape of which the long-axis direction is parallel to the track extending direction.
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