Invention Grant
- Patent Title: Electrostatic chuck
- Patent Title (中): 静电吸盘
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Application No.: US13639283Application Date: 2011-07-26
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Publication No.: US08810992B2Publication Date: 2014-08-19
- Inventor: Hiroshi Ono
- Applicant: Hiroshi Ono
- Applicant Address: JP Kyoto
- Assignee: Kyocera Corporation
- Current Assignee: Kyocera Corporation
- Current Assignee Address: JP Kyoto
- Agency: Volpe and Koenig, P.C.
- Priority: JP2010-167247 20100726
- International Application: PCT/JP2011/066924 WO 20110726
- International Announcement: WO2012/014873 WO 20120202
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01T23/00 ; C04B35/185 ; C04B35/581 ; C04B35/111 ; C04B35/195

Abstract:
There is provided an electrostatic chuck an electrostatic chuck in which it is hard for the power of suppressing residual adsorption to deteriorate over time. There is provided an electrostatic chuck including an insulating substrate, and an adsorption electrode, wherein a region which includes at least an upper face of the insulating substrate containing Mn is made of ceramics containing a first transition element composed of at least one of Fe and Cr, and a ratio C2/C1 of a content C2 (mol) of the first transition element to a content C1 (mol) of Mn contained in the insulating substrate is 1 or more.
Public/Granted literature
- US20130120896A1 ELECTROSTATIC CHUCK Public/Granted day:2013-05-16
Information query
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