Invention Grant
- Patent Title: Variable resistance memory device and method of manufacturing the same
- Patent Title (中): 可变电阻存储器件及其制造方法
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Application No.: US13919120Application Date: 2013-06-17
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Publication No.: US08811062B2Publication Date: 2014-08-19
- Inventor: Byeung Chul Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2010-0114542 20101117
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00 ; H01L27/10 ; H01L45/00

Abstract:
A variable resistance memory device has memory cells that are operated by Joule's heat and which are highly thermally efficient. Conductive patterns are formed on a substrate; sacrificial patterns exposing a portion of the top surface of each of the conductive patterns are formed on the conductive patterns, lower electrodes are formed by etching upper portions of the conductive patterns using the sacrificial patterns as an etching mask, then mold patterns are formed on the lower electrodes and cover exposed sidewall surfaces of the sacrificial patterns, and then the sacrificial patterns are replaced with variable resistance patterns.
Public/Granted literature
- US20130277637A1 VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-10-24
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