Invention Grant
- Patent Title: Method for manufacturing an optical waveguide, optical waveguide, and sensor arrangement
- Patent Title (中): 光波导,光波导和传感器装置的制造方法
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Application No.: US12988421Application Date: 2009-02-18
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Publication No.: US08811790B2Publication Date: 2014-08-19
- Inventor: Hans-Peter Niederberger , Josef Schuller , Gottfried Reiter
- Applicant: Hans-Peter Niederberger , Josef Schuller , Gottfried Reiter
- Applicant Address: AU Anif
- Assignee: Sony DADC Austria AG
- Current Assignee: Sony DADC Austria AG
- Current Assignee Address: AU Anif
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: EP08007662 20080418
- International Application: PCT/EP2009/001145 WO 20090218
- International Announcement: WO2009/132726 WO 20091105
- Main IPC: G02B6/02
- IPC: G02B6/02

Abstract:
A method for manufacturing an optical waveguide, in which a waveguide structure including a waveguide layer of ZnS—SiO2 is deposited on a first layer, wherein a first refractive index of the first layer is lower than the refractive index of the waveguide layer. A sensor arrangement includes a planar optical waveguide, a light source, a sensor, an application unit for applying an analyte on top of the planar waveguide and a processor connected to the sensor.
Public/Granted literature
- US20110112769A1 METHOD FOR MANUFACTURING AN OPTICAL WAVEGUIDE, OPTICAL WAVEGUIDE, AND SENSOR ARRANGEMENT Public/Granted day:2011-05-12
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