Invention Grant
US08814488B2 Substrate processing apparatus and semiconductor device manufacturing method 有权
基板加工装置及半导体装置的制造方法

Substrate processing apparatus and semiconductor device manufacturing method
Abstract:
A substrate processing apparatus comprises a storage container for storing multiple substrates and whose substrate loading and unloading opening is sealed by a lid, a load port for placing the storage container, an attaching and detaching device for attaching and detaching the lid on the substrate loading and unloading opening in the load port, a first placement unit for mounting the storage container in the load port and moving away from and near the attaching and detaching device, and a second placement unit provided separately from the first placement unit, for mounting the storage container in the load port and moving up and down relative to the attaching and detaching device.
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