Invention Grant
- Patent Title: Heating unit and substrate processing apparatus having the same
- Patent Title (中): 加热单元和具有该加热单元的基板处理设备
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Application No.: US12857723Application Date: 2010-08-17
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Publication No.: US08815016B2Publication Date: 2014-08-26
- Inventor: Jong-Won Hong , Min-Jae Jeong , Heung-Yeol Na , Eu-Gene Kang , Seok-Rak Chang
- Applicant: Jong-Won Hong , Min-Jae Jeong , Heung-Yeol Na , Eu-Gene Kang , Seok-Rak Chang
- Applicant Address: KR Yongin
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2009-0107175 20091106
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A substrate processing apparatus includes a heating unit that heats a processing chamber that processes a plurality of substrates and that quickly cools the processing chamber after the processing. The heating unit includes a body having an intake port and an exhaust port, one or more heaters located inside the body, a cooler connected to the intake port of the body, an exhaust pump connected to the exhaust port of the body, and a controller controlling the cooler. The substrate processing apparatus includes a boat in which a plurality of substrates are stacked, a processing chamber providing a space in which the substrates are processed, a transfer unit carrying the boat into or out of the processing chamber, and the heating unit located outside the processing chamber.
Public/Granted literature
- US20110107970A1 HEATING UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME Public/Granted day:2011-05-12
Information query
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