Invention Grant
- Patent Title: Plasma chemical reactor
- Patent Title (中): 等离子体化学反应器
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Application No.: US12254686Application Date: 2008-10-20
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Publication No.: US08815047B2Publication Date: 2014-08-26
- Inventor: Hwankook Chae , Dongseok Lee , Heeseok Moon , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Applicant: Hwankook Chae , Dongseok Lee , Heeseok Moon , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Applicant Address: KR Kyungki-Do
- Assignee: DMS Co., Ltd.
- Current Assignee: DMS Co., Ltd.
- Current Assignee Address: KR Kyungki-Do
- Agency: IPLA P.A.
- Agent James E. Bame
- Priority: KR10-2007-0118985 20071121
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/00 ; C23F1/00 ; H01L21/306 ; H01J37/32 ; C23C16/505 ; C23C16/458
Abstract:
A plasma chemical reactor includes a chamber for providing a plasma reaction space, and a cathode assembly coupled at one side to a wall surface of the chamber and supporting a substrate at the other side such that the substrate is positioned at a center inside the chamber, and installed to enable height adjustment such that the substrate can maintain a horizontal state.
Public/Granted literature
- US20090129997A1 PLASMA CHEMICAL REACTOR Public/Granted day:2009-05-21
Information query
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