Invention Grant
- Patent Title: Spectra based endpointing for chemical mechanical polishing
- Patent Title (中): 基于光谱的化学机械抛光终点
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Application No.: US13339057Application Date: 2011-12-28
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Publication No.: US08815109B2Publication Date: 2014-08-26
- Inventor: Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David
- Applicant: Boguslaw A. Swedek , Dominic J. Benvegnu , Jeffrey Drue David
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: C03C15/00
- IPC: C03C15/00

Abstract:
A computer implemented method of monitoring a polishing process includes, for each sweep of a plurality of sweeps of an optical sensor across a substrate undergoing polishing, obtaining a plurality of current spectra, each current spectrum of the plurality of current spectra being a spectrum resulting from reflection of white light from the substrate, for each sweep of the plurality of sweeps, determining a difference between each current spectrum and each reference spectrum of a plurality of reference spectra to generate a plurality of differences, for each sweep of the plurality of sweeps, determining a smallest difference of the plurality of differences, thus generating a sequence of smallest difference, and determining a polishing endpoint based on the sequence of smallest differences.
Public/Granted literature
- US20120100642A1 Spectra Based Endpointing for Chemical Mechanical Polishing Public/Granted day:2012-04-26
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