Invention Grant
US08815112B2 Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus
有权
液体处理方法，具有用于执行液体处理方法的记录程序的记录介质和液体处理装置
- Patent Title: Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus
- Patent Title (中): 液体处理方法，具有用于执行液体处理方法的记录程序的记录介质和液体处理装置
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Application No.: US13223543Application Date: 2011-09-01
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Publication No.: US08815112B2Publication Date: 2014-08-26
- Inventor: Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
- Applicant: Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2010-210009 20100917
- Main IPC: C25F3/00
- IPC: C25F3/00 ; C23F1/08 ; H01L21/67 ; H01L21/02 ; H01L21/687
Abstract:
Disclosed is a method for processing a substrate including a first process and a second process. The first process comprises supporting the substrate formed with a titanium-containing film on its front surface and rear surface by a support unit which is rotatably installed; rotating the substrate along with the support unit; and supplying a first processing liquid containing hydrofluoric acid to the rear surface of the substrate thereby processing the rear surface of the substrate with the first processing liquid. The second process comprises supplying a second processing liquid containing ammonia hydrogen peroxide mixture to the rear surface of the substrate after the first process is completed, thereby processing the rear surface of the substrate with the second processing liquid.
Public/Granted literature
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