Invention Grant
- Patent Title: Magnetic recording medium manufacturing method
- Patent Title (中): 磁记录介质制造方法
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Application No.: US13658658Application Date: 2012-10-23
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Publication No.: US08815336B2Publication Date: 2014-08-26
- Inventor: Kaori Kimura , Masatoshi Sakurai , Kazuto Kashiwagi , Akihiko Takeo
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2012-145757 20120628
- Main IPC: B05D5/12
- IPC: B05D5/12 ; G11B5/84 ; G11B5/74

Abstract:
According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.
Public/Granted literature
- US20140004272A1 MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD Public/Granted day:2014-01-02
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