Invention Grant
US08815392B2 Process for producing doped gallium arsenide substrate wafers having low optical absorption coefficient 有权
具有低光吸收系数的掺杂砷化镓衬底晶片的制造方法

Process for producing doped gallium arsenide substrate wafers having low optical absorption coefficient
Abstract:
A process is disclosed for producing a doped gallium arsenide single crystal by melting a gallium arsenide starting material and subsequently solidifying the gallium arsenide melt, wherein the gallium arsenide melt contains an excess of gallium relative to the stoichiometric composition, and wherein it is provided for a boron concentration of at least 5×1017 cm−3 in the melt or in the obtained crystal. The thus obtained crystal is characterized by a unique combination of low dislocation density, high conductivity and yet excellent, very low optic absorption, particularly in the range of the near infrared.
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