Invention Grant
- Patent Title: Process for producing doped gallium arsenide substrate wafers having low optical absorption coefficient
- Patent Title (中): 具有低光吸收系数的掺杂砷化镓衬底晶片的制造方法
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Application No.: US13672177Application Date: 2012-11-08
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Publication No.: US08815392B2Publication Date: 2014-08-26
- Inventor: Ulrich Kretzer , Frank Börner , Stefan Eichler , Frieder Kropfgans
- Applicant: Freiberger Compound Materials GmbH
- Applicant Address: DE Freiberg
- Assignee: Freiberger Compound Materials GmbH
- Current Assignee: Freiberger Compound Materials GmbH
- Current Assignee Address: DE Freiberg
- Agency: Foley & Lardner LLP
- Main IPC: B32B5/16
- IPC: B32B5/16

Abstract:
A process is disclosed for producing a doped gallium arsenide single crystal by melting a gallium arsenide starting material and subsequently solidifying the gallium arsenide melt, wherein the gallium arsenide melt contains an excess of gallium relative to the stoichiometric composition, and wherein it is provided for a boron concentration of at least 5×1017 cm−3 in the melt or in the obtained crystal. The thus obtained crystal is characterized by a unique combination of low dislocation density, high conductivity and yet excellent, very low optic absorption, particularly in the range of the near infrared.
Public/Granted literature
- US20130320242A1 PROCESS FOR PRODUCING DOPED GALLIUM ARSENIDE SUBSTRATE WAFERS HAVING LOW OPTICAL ABSORPTION COEFFICIENT Public/Granted day:2013-12-05
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