Invention Grant
- Patent Title: Protective film and encapsulation material comprising the same
- Patent Title (中): 保护膜和包含其的包封材料
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Application No.: US12241976Application Date: 2008-09-30
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Publication No.: US08815404B2Publication Date: 2014-08-26
- Inventor: Kwang Hee Lee , Xavier Bulliard , Yi Yeol Lyu , Hyeon Jin Shin , Yun Hyuk Choi
- Applicant: Kwang Hee Lee , Xavier Bulliard , Yi Yeol Lyu , Hyeon Jin Shin , Yun Hyuk Choi
- Applicant Address: KR KR
- Assignee: Samsung Electronics Co., Ltd.,Cheil Industries Inc.
- Current Assignee: Samsung Electronics Co., Ltd.,Cheil Industries Inc.
- Current Assignee Address: KR KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0031873 20080404
- Main IPC: B32B9/04
- IPC: B32B9/04 ; B32B13/04

Abstract:
Disclosed herein is a protective film. The protective film is produced by alternate coating of a polysilazane-based polymer and a flexible polysiloxane-based polymer. The polysilazane-based polymer is cured at low temperature to form silica, thereby achieving high hardness and high light transmittance. The protective film has improved interfacial adhesion between the respective coating films, which prevents permeation of moisture and oxygen. In addition, the protective film can be easily produced by low-temperature wet processes. Also disclosed herein is an encapsulation material comprising the protective film.
Public/Granted literature
- US20090252975A1 PROTECTIVE FILM AND ENCAPSULATION MATERIAL COMPRISING THE SAME Public/Granted day:2009-10-08
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