Invention Grant
US08815477B2 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
有权
彩色滤光片制造方法，图案化基板制造方法和小型光掩模
- Patent Title: Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
- Patent Title (中): 彩色滤光片制造方法，图案化基板制造方法和小型光掩模
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Application No.: US12926433Application Date: 2010-11-17
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Publication No.: US08815477B2Publication Date: 2014-08-26
- Inventor: Takeshi Ikeda , Eishi Aoki , Genki Harada
- Applicant: Takeshi Ikeda , Eishi Aoki , Genki Harada
- Applicant Address: JP Tokyo
- Assignee: Toppan Printing Co., Ltd.
- Current Assignee: Toppan Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2008-139163 20080528
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/20
Abstract:
A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.
Public/Granted literature
- US20110070532A1 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask Public/Granted day:2011-03-24
Information query
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