Invention Grant
- Patent Title: Method of manufacturing thick-film electrode
- Patent Title (中): 厚膜电极的制造方法
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Application No.: US13915681Application Date: 2013-06-12
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Publication No.: US08815638B2Publication Date: 2014-08-26
- Inventor: Kazutaka Ozawa
- Applicant: E I du Pont de Nemours and Company
- Applicant Address: US DE Wilmington
- Assignee: E I du Pont de Nemours and Company
- Current Assignee: E I du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0224 ; H01B1/22

Abstract:
A method of manufacturing a thick-film electrode comprising the steps of: applying onto a substrate a conductive paste comprising a conductive powder, a glass frit, 3.5 to 12.5 weight percent of an organic polymer, and a solvent, wherein the weight percent is based on the total weight of the conductive powder, the glass frit, and the organic polymer; firing the applied conductive paste to form the thick-film electrode, wherein thickness of the thick-film electrode is 1 to 10 μm; and soldering a wire to the thick-film electrode.
Public/Granted literature
- US20130337604A1 METHOD OF MANUFACTURING THICK-FILM ELECTRODE Public/Granted day:2013-12-19
Information query
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