Invention Grant
US08815648B1 Multi-step sintering of metal paste for semiconductor device wire bonding
有权
用于半导体器件引线接合的金属糊料的多步烧结
- Patent Title: Multi-step sintering of metal paste for semiconductor device wire bonding
- Patent Title (中): 用于半导体器件引线接合的金属糊料的多步烧结
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Application No.: US13854400Application Date: 2013-04-01
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Publication No.: US08815648B1Publication Date: 2014-08-26
- Inventor: Kengo Aoya , Shohta Ujiie , Kazunori Hayata
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Steven A. Shaw; Frederick J. Telecky, Jr.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L23/00

Abstract:
A method of assembling semiconductor devices includes applying a metal paste including a plurality of metal particles having an average size less than 50 nanometers and a binder material onto a metal terminal of a package substrate. The metal paste is processed including a heat up step in a reducing gas atmosphere and then a vacuum sintering step at a temperature of at least 200° C. for forming a sintered metal coating. A semiconductor die is attached onto a die attach area of the package substrate. A bond wire is then connected between a bond pad on the semiconductor die and the sintered metal coating on the metal terminal.
Information query
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