Invention Grant
- Patent Title: Photoresists and methods for use thereof
- Patent Title (中): 光刻胶及其使用方法
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Application No.: US12969183Application Date: 2010-12-15
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Publication No.: US08815754B2Publication Date: 2014-08-26
- Inventor: Gerhard Pohlers
- Applicant: Gerhard Pohlers
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469
Abstract:
New photoresists are provided that comprise preferably as distinct components: a resin, a photoactive component and a phenolic component Preferred photoresists of the invention are can be useful for ion implant lithography protocols.
Public/Granted literature
- US20110254140A1 PHOTORESISTS AND METHODS FOR USE THEREOF Public/Granted day:2011-10-20
Information query
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