Invention Grant
- Patent Title: Shielded gate MOSFET device with a funnel-shaped trench
- Patent Title (中): 屏蔽栅极MOSFET器件,漏斗形沟槽
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Application No.: US13416416Application Date: 2012-03-09
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Publication No.: US08816431B2Publication Date: 2014-08-26
- Inventor: Brian Bowers
- Applicant: Brian Bowers
- Applicant Address: US CA San Jose
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Brake Hughes Bellermann LLP
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A MOSFET device has a funnel-shaped trench etched in a semiconductor substrate. The funnel-shaped trench has flared rim extending from a wider cross section trench mouth at the surface of the semiconductor substrate to a narrower cross section trench body portion which terminates in an epilayer portion of the semiconductor substrate. A gate electrode is disposed in the trench on the flared rim. Source and gate regions of the device abut upper and lower portions of the flared rim, respectively. A drain region of the device, which abuts the narrower cross section trench body portion, is self-aligned with a lower edge of a gate electrode.
Public/Granted literature
- US20130234241A1 SHIELDED GATE MOSFET DEVICE WITH A FUNNEL-SHAPED TRENCH Public/Granted day:2013-09-12
Information query
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