Invention Grant
- Patent Title: Patterned retarder film and method for manufacturing the same
- Patent Title (中): 图案化延迟片及其制造方法
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Application No.: US13548200Application Date: 2012-07-13
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Publication No.: US08817209B2Publication Date: 2014-08-26
- Inventor: Chen-Kuan Kuo , Che-Kuei Kang
- Applicant: Chen-Kuan Kuo , Che-Kuei Kang
- Applicant Address: TW Taoyuan County
- Assignee: BenQ Materials Corporation
- Current Assignee: BenQ Materials Corporation
- Current Assignee Address: TW Taoyuan County
- Agency: CKC & Partners Co., Ltd.
- Priority: TW100138872A 20111026
- Main IPC: G02F1/1335
- IPC: G02F1/1335 ; G02B5/20 ; G02B5/30 ; B32B38/06 ; G02B27/26 ; B32B38/00 ; B32B37/24 ; H04N13/04

Abstract:
Disclosed is a patterned retarder film which comprises a substrate, a patterned configuration layer and a liquid crystal layer. The patterned configuration layer includes a plurality of first regions and a plurality of second regions A liquid crystal layer is disposed on the patterned configuration layer, wherein liquid crystal molecules above the first regions is arranged irregularly because of the protrusions, the liquid crystal molecules above the second regions are aligned with the aligning micro-structures. The liquid crystal layer in above the first regions provides a first phase retardation, the liquid crystal layer above the second regions provides a second phase retardation, and the difference between the first phase retardation and the second phase retardation is 180°. The method for manufacturing the same is disclosed.
Public/Granted literature
- US20130107192A1 PATTERNED RETARDER FILM AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-05-02
Information query
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