Invention Grant
- Patent Title: Method of cooling an optical element, lithographic apparatus and method for manufacturing a device
- Patent Title (中): 冷却光学元件的方法,光刻设备及其制造方法
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Application No.: US13081190Application Date: 2011-04-06
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Publication No.: US08817229B2Publication Date: 2014-08-26
- Inventor: Franciscus Johannes Joseph Janssen , Erik Roelof Loopstra
- Applicant: Franciscus Johannes Joseph Janssen , Erik Roelof Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G02B7/18 ; G03F7/20 ; F28D15/00

Abstract:
A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.
Public/Granted literature
- US20110249245A1 METHOD OF COOLING AN OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING A DEVICE Public/Granted day:2011-10-13
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