Invention Grant
- Patent Title: Lithographic apparatus and method involving a pockels cell
- Patent Title (中): 涉及斑纹细胞的平版印刷设备和方法
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Application No.: US12436604Application Date: 2009-05-06
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Publication No.: US08817235B2Publication Date: 2014-08-26
- Inventor: Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
- Applicant: Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03B27/32
Abstract:
A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam.
Public/Granted literature
- US20090279066A1 LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2009-11-12
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