Invention Grant
- Patent Title: Manufacturing method of a piezoelectric element and a liquid ejecting head
- Patent Title (中): 压电元件和液体喷射头的制造方法
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Application No.: US13197464Application Date: 2011-08-03
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Publication No.: US08819903B2Publication Date: 2014-09-02
- Inventor: Toshihiro Shimizu , Jiro Kato , Eiju Hirai , Hiroshi Ito
- Applicant: Toshihiro Shimizu , Jiro Kato , Eiju Hirai , Hiroshi Ito
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2010-175478 20100804
- Main IPC: H04R17/00
- IPC: H04R17/00 ; H01L41/29 ; B41J2/16 ; H01L41/314 ; B41J2/14

Abstract:
A manufacturing method of a piezoelectric element includes: forming a first conductive layer upon a substrate; forming a piezoelectric layer upon the first conductive layer; forming a second conductive layer upon the piezoelectric layer; forming a third conductive layer upon the second conductive layer; forming a first portion, a second portion, and an opening portion provided between the first portion and the second portion by patterning the third conductive layer; forming a resist layer that covers the opening portion and covers the edges of the first portion and the second portion that face the opening portion side; and forming a first conductive portion and a second conductive portion configured from the first portion and the second portion, and forming a third conductive portion configured from the second conductive layer, by dry-etching the second conductive layer using the first portion, the second portion, and the resist layer as a mask.
Public/Granted literature
- US20120030915A1 MANUFACTURING METHOD OF A PIEZOELECTRIC ELEMENT AND A LIQUID EJECTING HEAD Public/Granted day:2012-02-09
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