Invention Grant
- Patent Title: Maintenance method of liquid ejection head and liquid ejection apparatus
- Patent Title (中): 液体喷射头和液体喷射装置的维护方法
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Application No.: US12569645Application Date: 2009-09-29
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Publication No.: US08820889B2Publication Date: 2014-09-02
- Inventor: Katsuyuki Hirato
- Applicant: Katsuyuki Hirato
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-253430 20080930
- Main IPC: B41J2/165
- IPC: B41J2/165

Abstract:
A maintenance method of a liquid ejection head including a nozzle forming surface where a plurality of nozzles having a polygonal planar shape including a plurality of corners which each have two sides and an angle between the two sides are formed, includes the step of causing a relative movement of a sweep member and the head so as to sweep the nozzle forming surface of the liquid ejection head in such a manner that the sweep member is moved in a direction making an angle within π/8 radian with respect to a direction in which any of the sides extends.
Public/Granted literature
- US20100079540A1 MAINTENANCE METHOD OF LIQUID EJECTION HEAD AND LIQUID EJECTION APPARATUS Public/Granted day:2010-04-01
Information query
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