Invention Grant
- Patent Title: Polypyrrolidone polishing composition and method
- Patent Title (中): 聚吡咯烷酮抛光组合物及方法
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Application No.: US13606599Application Date: 2012-09-07
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Publication No.: US08821215B2Publication Date: 2014-09-02
- Inventor: Nevin Naguib Sant
- Applicant: Nevin Naguib Sant
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas E Omholt; Alisha K. Bull; Steven D Weseman
- Main IPC: B24B37/04
- IPC: B24B37/04
Abstract:
The invention provides a polishing composition containing a pyrrolidone polymer, an aminophosphonic acid, a tetraalkylammonium salt, and water, wherein the composition has a pH of about 7 to about 11.7. The invention further provides a method of using such a polishing composition to polish a substrate, especially a substrate containing silicon.
Public/Granted literature
- US20140073226A1 POLYPYRROLIDONE POLISHING COMPOSITION AND METHOD Public/Granted day:2014-03-13
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