Invention Grant
- Patent Title: Particle capture unit, method for manufacturing the same, and substrate processing apparatus
- Patent Title (中): 粒子捕获单元,其制造方法和基板处理装置
-
Application No.: US13428614Application Date: 2012-03-23
-
Publication No.: US08821607B2Publication Date: 2014-09-02
- Inventor: Tsuyoshi Moriya , Syunsuke Toyoizumi , Katsuyuki Takahiro
- Applicant: Tsuyoshi Moriya , Syunsuke Toyoizumi , Katsuyuki Takahiro
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2011-068473 20110325
- Main IPC: B01D46/00
- IPC: B01D46/00 ; F04B37/08

Abstract:
A particle capture unit adopted to be exposed to a space in which particles fly includes at least a first layer formed of a plurality of first fiber-like materials and a second layer formed of a plurality of second fiber-like materials. The first fiber-like materials are thinner than the second fiber-like materials and arrangement density of the first fiber-like materials in the first layer is higher than that of the second fiber-like materials in the second layer, the second layer is interposed between the first layer and the space, and the first and second layers are hardened and bonded together by sintering.
Public/Granted literature
- US20120240533A1 PARTICLE CAPTURE UNIT, METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2012-09-27
Information query