Provided is a continuous deposition apparatus wherein replacement operations of a feeding unit and a take-up unit are easily performed. The continuous deposition apparatus is provided with: a vacuum chamber (1); a deposition roller (2); evaporation sources (7L1, 7L2, 7R) which supply a deposition material to a film substrate from the side of the film substrate which is wound on the deposition roller and on which a coating is to be deposited; a feeding unit (3) which supplies the film substrate to the deposition roller (2); and a take-up unit (4) which takes up the film substrate after the coating is deposited thereon. The vacuum chamber (1) is provided with: an evaporation source opening for carrying out and carrying in the evaporation sources; evaporation source door sections (16L, 16R) which open and close the evaporation source opening; another opening provided for the substrate on which the coating is to be deposited, besides the evaporation source opening, for the purpose of carrying out and carrying in the feeding unit (3) and the take-up unit (4); and door sections (17L, 17R) which are provided for the substrate and open and close the opening provided for the substrate.