Invention Grant
- Patent Title: Method for regenerating silicon from silicon waste and silicon manufactured using the same
- Patent Title (中): 从硅废料再生硅的方法和使用其制造的硅
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Application No.: US12576238Application Date: 2009-10-08
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Publication No.: US08821826B2Publication Date: 2014-09-02
- Inventor: Gu Sung Kim , Kun Kul Ryoo , Jae June Kim
- Applicant: Gu Sung Kim , Kun Kul Ryoo , Jae June Kim
- Applicant Address: KR
- Assignee: Epworks Co., Ltd.
- Current Assignee: Epworks Co., Ltd.
- Current Assignee Address: KR
- Priority: KR10-2009-0094103 20091001
- Main IPC: C01B33/02
- IPC: C01B33/02 ; B01D1/00 ; B03D1/00 ; C02F1/24 ; C01B33/037 ; B03D1/24

Abstract:
A method for regenerating silicon from silicon waste includes: placing and mixing silicon waste, a solvent having pH of approximately 5 to approximately 6, and a surfactant within a container; and injecting air into the container to separate floating matters and precipitates. Accordingly, since silicon is easily separated from the silicon waste, the regeneration yield of silicon is increased. Since the regenerated silicon is recyclable, it may be possible to obtain important substitution effect of high-purity silicon the entire amount of which depends on import. Moreover, environmental pollution may be reduced because the amount of the silicon waste disposed of by burial is decreased.
Public/Granted literature
- US20110081289A1 METHOD FOR REGENERATING SILICON FROM SILICON WASTE AND SILICON MANUFACTURED USING THE SAME Public/Granted day:2011-04-07
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