Invention Grant
- Patent Title: Reticles with subdivided blocking regions
- Patent Title (中): 具有细分阻塞区域的网格
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Application No.: US13763092Application Date: 2013-02-08
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Publication No.: US08822108B2Publication Date: 2014-09-02
- Inventor: J. Brett Rolfson
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: G03F1/00
- IPC: G03F1/00

Abstract:
Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The methods may include configuring the reticle to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region.
Public/Granted literature
- US20130157179A1 RETICLES WITH SUBDIVIDED BLOCKING REGIONS Public/Granted day:2013-06-20
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