Siloxane-based compound, photosensitive composition comprising the same and photosensitive material

Invention Grant

US08822112B2 Siloxane-based compound, photosensitive composition comprising the same and photosensitive material 有权

Title translation: 基于硅氧烷的化合物，包含它们的光敏组合物和感光材料

Patent Title: Siloxane-based compound, photosensitive composition comprising the same and photosensitive material
Patent Title (中): 基于硅氧烷的化合物，包含它们的光敏组合物和感光材料
Application No.: US14005151

Application Date: 2013-01-25
Publication No.: US08822112B2

Publication Date: 2014-09-02
Inventor: Keon Woo Lee , Sang Kyu Kwak , Changsoon Lee , Hyehyeon Kim , Saehee Kim
Applicant: LG Chem, Ltd.
Applicant Address: KR Seoul
Assignee: LG Chem, Ltd.
Current Assignee: LG Chem, Ltd.
Current Assignee Address: KR Seoul
Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
Priority: KR10-2012-0032949 20120330; KR10-2013-0007949 20130124
International Application: PCT/KR2013/000600 WO 20130125
International Announcement: WO2013/147411 WO 20130310
Main IPC: G03F7/004
IPC: G03F7/004 ; C07F7/10

Abstract:

The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.

Abstract(Chinese):

本申请涉及硅氧烷类化合物，包含它的光敏组合物和感光材料。

Public/Granted literature

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）