Invention Grant
- Patent Title: Method for manufacturing a light-emitting element including a protective film for a charge injection layer
- Patent Title (中): 包括电荷注入层用保护膜的发光元件的制造方法
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Application No.: US13205765Application Date: 2011-08-09
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Publication No.: US08822246B2Publication Date: 2014-09-02
- Inventor: Tetsuro Kondoh , Kou Sugano , Seiji Nishiyama
- Applicant: Tetsuro Kondoh , Kou Sugano , Seiji Nishiyama
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2009-028969 20090210
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L51/50 ; H01L51/56 ; H01L27/32

Abstract:
A method for manufacturing a light-emitting element. An anode is formed on a main surface of a substrate. A hole-injection layer is formed at least above the anode. At least the hole-injection layer is covered with a protective film. A bank which is provided with an aperture through which a portion of the protective film is exposed, is formed on the protective film by a wet process. The portion of the protective film exposed through the aperture is removed so that a portion of the hole-injection layer is exposed, a light-emitting layer is formed on the hole-injection layer exposed through the aperture, and a cathode is formed above the light-emitting layer. The protective film is resistant to a fluid used during the wet process.
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