Invention Grant
- Patent Title: Optical semiconductor element and manufacturing method of the same
- Patent Title (中): 光半导体元件及其制造方法
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Application No.: US13412217Application Date: 2012-03-05
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Publication No.: US08822247B2Publication Date: 2014-09-02
- Inventor: Tatsuma Saito
- Applicant: Tatsuma Saito
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz Holtz Goodman & Chick PC
- Priority: JP2011-048786 20110307
- Main IPC: H01L33/30
- IPC: H01L33/30 ; H01L33/00 ; H01L33/20 ; H01L33/22 ; H01L33/32

Abstract:
An optical semiconductor element and a manufacturing method thereof that can improve the light extraction efficiency with maintaining the yield. The manufacturing method includes forming a plurality of recesses arranged at equal intervals along a crystal axis of a semiconductor film in a surface of the semiconductor film; and performing an etching process on the surface of the semiconductor film, thereby forming a plurality of protrusions arranged according to the arrangement form of the plurality of recesses and deriving from the crystal structure of the semiconductor film in the surface of the semiconductor film.
Public/Granted literature
- US20120228670A1 OPTICAL SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2012-09-13
Information query
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