Invention Grant
US08822258B2 Wafer level bonding method for fabricating wafer level camera lenses
有权
用于制造晶片级摄像机镜头的晶片级焊接方法
- Patent Title: Wafer level bonding method for fabricating wafer level camera lenses
- Patent Title (中): 用于制造晶片级摄像机镜头的晶片级焊接方法
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Application No.: US13865814Application Date: 2013-04-18
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Publication No.: US08822258B2Publication Date: 2014-09-02
- Inventor: Regis Fan
- Applicant: OmniVision Technologies (Shanghai) Co., Ltd.
- Applicant Address: CN Shanghai
- Assignee: OmniVision Technologies (Shanghai) Co., Ltd.
- Current Assignee: OmniVision Technologies (Shanghai) Co., Ltd.
- Current Assignee Address: CN Shanghai
- Agency: Blakely Sokoloff Taylor & Zafman
- Priority: CN201210367894 20120927
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/146 ; G02B13/00 ; H01L21/66 ; G02B3/00

Abstract:
A wafer-level bonding method for fabricating wafer level camera lenses is disclosed. The method includes: providing a lens wafer including lenses arranged in an array and a sensor wafer including sensors arranged in an array; measuring and analyzing an FFL of each lens to obtain a corresponding FFL compensation value for each lens; forming a thin transparent film (TTF) on each sensor of the sensor wafer, and the thickness of TTF is determined by the FFL compensation value of the corresponding lens; aligning and bonding the lens wafer with the sensor wafer having TTFs formed thereon. Since the focal length of each lens is adjusted to compensate the FFL of the lens by adding a TTF of transparent optical material with an index of refraction that is similar to the index of refraction of the sensor cover glass, the FFL variation of each camera lens can be reduced.
Public/Granted literature
- US20140087491A1 WAFER LEVEL BONDING METHOD FOR FABRICATING WAFER LEVEL CAMERA LENSES Public/Granted day:2014-03-27
Information query
IPC分类: