Invention Grant
US08822260B2 Asymmetric surface texturing for use in a photovoltaic cell and method of making
有权
用于光伏电池的非对称表面纹理及其制造方法
- Patent Title: Asymmetric surface texturing for use in a photovoltaic cell and method of making
- Patent Title (中): 用于光伏电池的非对称表面纹理及其制造方法
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Application No.: US13785066Application Date: 2013-03-05
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Publication No.: US08822260B2Publication Date: 2014-09-02
- Inventor: Christopher J. Petti
- Applicant: GTAT Corporation
- Applicant Address: US NH Merrimack
- Assignee: GTAT Corporation
- Current Assignee: GTAT Corporation
- Current Assignee Address: US NH Merrimack
- Agency: The Mueller Law Office, P.C.
- Main IPC: H01L31/0236
- IPC: H01L31/0236
Abstract:
A novel surface texturing provides improved light-trapping characteristics for photovoltaic cells. The surface is asymmetric and includes shallow slopes at between about 5 and about 30 degrees from horizontal as well as steeper slopes at about 70 degrees or more from horizontal. It is advantageously used as either the front or back surface of a thin semiconductor lamina, for example between about 1 and about 20 microns thick, which comprises at least the base or emitter of a photovoltaic cell. In embodiments of the present invention, the shallow slopes are formed using imprint photolithography.
Public/Granted literature
- US20130183790A1 ASYMMETRIC SURFACE TEXTURING FOR USE IN A PHOTOVOLTAIC CELL AND METHOD OF MAKING Public/Granted day:2013-07-18
Information query
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