Invention Grant
- Patent Title: Nonvolatile memory device and method of manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US13605957Application Date: 2012-09-06
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Publication No.: US08822285B2Publication Date: 2014-09-02
- Inventor: Sung Min Hwang , Il Seok Seo
- Applicant: Sung Min Hwang , Il Seok Seo
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2011-0139987 20111222
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L29/792 ; H01L27/115

Abstract:
A nonvolatile memory device includes a substrate including a cell region, contact regions and dummy contact regions. The contact regions and the dummy contact regions alternately are disposed. A plurality of word lines stacked at the cell region of the substrate and contact groups stacked at the contact regions and the dummy contact regions of the substrate. The contact groups include a plurality of pad layers being coupled to the word lines, and each of the contact groups has stepped structure disposed at a corresponding contact region.
Public/Granted literature
- US20130161821A1 NONVOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-06-27
Information query
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