Invention Grant
US08822285B2 Nonvolatile memory device and method of manufacturing the same 有权
非易失性存储器件及其制造方法

Nonvolatile memory device and method of manufacturing the same
Abstract:
A nonvolatile memory device includes a substrate including a cell region, contact regions and dummy contact regions. The contact regions and the dummy contact regions alternately are disposed. A plurality of word lines stacked at the cell region of the substrate and contact groups stacked at the contact regions and the dummy contact regions of the substrate. The contact groups include a plurality of pad layers being coupled to the word lines, and each of the contact groups has stepped structure disposed at a corresponding contact region.
Public/Granted literature
Information query
Patent Agency Ranking
0/0