Invention Grant
US08822327B2 Contact pads with sidewall spacers and method of making contact pads with sidewall spacers
有权
具有侧壁间隔件的接触垫和用侧壁间隔件制造接触垫的方法
- Patent Title: Contact pads with sidewall spacers and method of making contact pads with sidewall spacers
- Patent Title (中): 具有侧壁间隔件的接触垫和用侧壁间隔件制造接触垫的方法
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Application No.: US13587809Application Date: 2012-08-16
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Publication No.: US08822327B2Publication Date: 2014-09-02
- Inventor: Johann Gatterbauer , Bernhard Weidgans
- Applicant: Johann Gatterbauer , Bernhard Weidgans
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/4763
- IPC: H01L21/4763

Abstract:
A chip contact pad and a method of making a chip contact pad are disclosed. An embodiment of the present invention includes forming a plurality of contact pads over a workpiece, each contact pad having lower sidewalls and upper sidewalls and reducing a lower width of each contact pad so that an upper width of each contact pad is larger than the lower width. The method further includes forming a photoresist over the plurality of contact pads and removing portions of the photoresist thereby forming sidewall spacers along the lower sidewalls.
Public/Granted literature
- US20140048941A1 Contact Pads with Sidewall Spacers and Method of Making Contact Pads with Sidewall Spacers Public/Granted day:2014-02-20
Information query
IPC分类: