Invention Grant
US08822623B2 High index and high impact resistant poly(thio)urethane/urea material, method of manufacturing same and its use in the optical field
有权
高指数和高耐冲击聚（硫）氨基甲酸酯/脲材料，其制造方法及其在光学领域的应用
- Patent Title: High index and high impact resistant poly(thio)urethane/urea material, method of manufacturing same and its use in the optical field
- Patent Title (中): 高指数和高耐冲击聚（硫）氨基甲酸酯/脲材料，其制造方法及其在光学领域的应用
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Application No.: US12838044Application Date: 2010-07-16
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Publication No.: US08822623B2Publication Date: 2014-09-02
- Inventor: Fadi O. Adileh , Aref Ben Ahmed Jallouli , Peiqi Jiang , Joey Oliveros Obordo , Yassin Yusef Turshani , Steven Weber
- Applicant: Fadi O. Adileh , Aref Ben Ahmed Jallouli , Peiqi Jiang , Joey Oliveros Obordo , Yassin Yusef Turshani , Steven Weber
- Applicant Address: FR Charenton le Pont
- Assignee: Essilor International (Compagnie Generale d'Optique)
- Current Assignee: Essilor International (Compagnie Generale d'Optique)
- Current Assignee Address: FR Charenton le Pont
- Agency: Fulbright & Jaworski LLP
- Main IPC: C08G18/52
- IPC: C08G18/52 ; C08G18/48 ; C08G18/10 ; C08G18/32 ; C08G18/38
Abstract:
A transparent, non elastomeric, high refractive index, impact resistant poly(thio)urethane/urea material comprising the reaction product of: a) at least one (α, ω)-diiso(thio)cyanate cycloaliphatic or aromatic polysulfide prepolymer, and b) at least one aromatic primary diamine, in an equivalent molar ratio amine function/iso(thio)cyanate function ranging from 0.5 to 2, wherein, said prepolymer and diamine are free from disulfide (—S—S—) linkage and wherein the (α, ω)-diiso(thio)cyanate polysulfide prepolymer is the reaction product of at least one cycloaliphatic or aromatic diiso(thio)cyanate and at least one (α, ω)-diol prepolymer.
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