Invention Grant
US08822876B2 Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
有权
多区域等离子处理静电卡盘具有改善的温度均匀性
- Patent Title: Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
- Patent Title (中): 多区域等离子处理静电卡盘具有改善的温度均匀性
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Application No.: US13081412Application Date: 2011-04-06
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Publication No.: US08822876B2Publication Date: 2014-09-02
- Inventor: Hamid Tavassoli , Surajit Kumar , Kallol Bera , Xiaoping Zhou , Shane C. Nevil , Douglas A. Buchberger, Jr.
- Applicant: Hamid Tavassoli , Surajit Kumar , Kallol Bera , Xiaoping Zhou , Shane C. Nevil , Douglas A. Buchberger, Jr.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: B23K10/00
- IPC: B23K10/00 ; H05H1/46

Abstract:
An electrostatic chuck assembly including a dielectric layer with a top surface to support a workpiece. A cooling channel base disposed below the dielectric layer includes a plurality of inner fluid conduits disposed beneath an inner portion of the top surface, and a plurality of outer fluid conduits disposed beneath an outer portion of the top surface. A chuck assembly includes a thermal break disposed within the cooling channel base between the inner and outer fluid conduits. A chuck assembly includes a fluid distribution plate disposed below the cooling channel base and the base plate to distribute a heat transfer fluid delivered from a common input to each inner or outer fluid conduit. The branches of the inner input manifold may have substantially equal fluid conductance.
Public/Granted literature
- US20120091104A1 MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEMPERATURE UNIFORMITY Public/Granted day:2012-04-19
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