Invention Grant
- Patent Title: Electron beam irradiation apparatus
- Patent Title (中): 电子束照射装置
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Application No.: US13775812Application Date: 2013-02-25
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Publication No.: US08822953B2Publication Date: 2014-09-02
- Inventor: Hirotoshi Shibuya , Toshiaki Naka , Yukinobu Nishino , Ryo Abe , Tokuo Nishi , Yukihiro Yamamoto
- Applicant: Shibuya Kogyo Co., Ltd.
- Applicant Address: JP Kanazawa-Shi, Ishikawa
- Assignee: Shibuya Kogyo Co., Ltd.
- Current Assignee: Shibuya Kogyo Co., Ltd.
- Current Assignee Address: JP Kanazawa-Shi, Ishikawa
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2012-042203 20120228
- Main IPC: A61L2/08
- IPC: A61L2/08 ; G21K5/00 ; H01J33/04

Abstract:
An electron beam irradiation apparatus is provided that includes a vacuum room, an electron beam generator, a window frame, and an irradiation foil. The vacuum room includes a wall having an opening through which an electron beam is irradiated. An internal atmosphere of the vacuum room is evacuated. The electron beam generator is provided inside the vacuum room. The window frame is attached to and surrounds the opening in the wall of the vacuum room. The irradiation foil, through which an electron beam generated in the vacuum room is transmitted, is fixed to the window frame. The surface of the window frame, at least an area exposed to the vacuum room, is substantially covered with material including an element or elements with an atomic number less than or equal to 10.
Public/Granted literature
- US20130221244A1 ELECTRON BEAM IRRADIATION APPARATUS Public/Granted day:2013-08-29
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